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1

Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool

Wang, Yow-Gwo, Neureuther, Andrew R., Naulleau, Patrick P.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 2.66 MB

english, 2017

2

Impact of tool design on defect detection sensitivity in extreme ultraviolet actinic blank inspection

Wang, Yow-Gwo, Neureuther, Andrew R., Naulleau, Patrick P.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 3.27 MB

english, 2017

3

Modeling Optical Lithography Physics

Neureuther, Andrew R., Rubinstein, Juliet, Chin, Eric, Wang, Lynn, Miller, Marshal, Clifford, Chris, Yamazoe, Kenji

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 620 KB

english, 2010

4

Ultrabroadband mirror using low-index cladded subwavelength grating

C.F.R. Mateus, M.C.Y. Huang, Yunfei Deng, A.R. Neureuther, C.J. Chang-Hasnain

Journal:

IEEE Photonics Technology Letters

Year:

2004

Language:

english

File:

PDF, 300 KB

english, 2004

5

A hierarchical production plan for a make-to-order steel fabrication plant

Neureuther, Brian D., Polak, George G., Sanders, Nada R.

Journal:

Production Planning & Control

Year:

2004

Language:

english

File:

PDF, 285 KB

english, 2004

6

Monitoring polarization and high-numerical aperture with phase shifting masks: Radial phase grating

G. Mcintyre, A. R. Neureuther

Year:

2005

Language:

english

File:

PDF, 800 KB

english, 2005

7

Energy deposition and transfer in electron-beam lithography

B. Wu, A. R. Neureuther

Year:

2001

Language:

english

File:

PDF, 633 KB

english, 2001

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Comparative analysis of shot noise in EUV and e-beam lithography

Wood, Obert R., Panning, Eric M., Bhattarai, Suchit, Chao, Weilun, Neureuther, Andrew R., Naulleau, Patrick P.

Year:

2014

Language:

english

File:

PDF, 4.52 MB

english, 2014

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Simulation analysis of LER and dose tradeoffs for EUV resists with photo-decomposable quenchers

Bhattarai, Suchit, Naulleau, Patrick P., Neureuther, Andrew R., Naulleau, Patrick P.

Year:

2013

Language:

english

File:

PDF, 1022 KB

english, 2013

10

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Nagahara, Seiji, Sturtevant, John L., Yuan, Lei, Poppe, Wojtek Jacob, Neureuther, Andrew, Kono, Yoshiyuki, Sekiguchi, Atsushi, Fujiwara, Koichi, Watanabe, Tsuyoshi (Gary), Taira, Kazuo, Kusumoto, Shir

Year:

2005

Language:

english

File:

PDF, 459 KB

english, 2005

11

A spectrophotometric method for the determination of zinc, copper, and cobalt ions in metalloproteins using Zincon

Crystal E. Säbel, Joseph M. Neureuther, Stefan Siemann

Journal:

Analytical Biochemistry

Year:

2010

Language:

english

File:

PDF, 562 KB

english, 2010

12

Line-Profile resist development simulation techniques

R. E. Jewett, P. I. Hagouel, A. R. Neureuther, T. Van Duzer

Journal:

Polymer Engineering & Science

Year:

1977

Language:

english

File:

PDF, 330 KB

english, 1977

13

Influence of atmospheric deposition on lake mass balances in the Turkey Lakes Watershed, Central Ontario

D. S. Jeffries, R. G. Semkin, R. Neureuther, M. Seymour, J. A. Nicolson

Journal:

Water, Air & Soil Pollution

Year:

1986

Language:

english

File:

PDF, 596 KB

english, 1986

14

Conceptualizing Variation and Control Chart Theory

Brian D. Neureuther

Journal:

Decision Sciences Journal of Innovative Education

Year:

2006

Language:

english

File:

PDF, 56 KB

english, 2006

15

Modeling projection printing of positive photoresists

Dill, F.H., Neureuther, A.R., Tuttle, J.A., Walker, E.J.

Journal:

IEEE Transactions on Electron Devices

Year:

1975

Language:

english

File:

PDF, 959 KB

english, 1975

16

Modeling of through-focus aerial image with aberration and imaginary mask edge effects in optical lithography simulation

Yamazoe, Kenji, Neureuther, Andrew R.

Journal:

Year:

2011

Language:

english

File:

PDF, 779 KB

english, 2011

17

Numerical Method for the Analysis of Diffraction Gratings

KALHOR, H. A., NEUREUTHER, A. R.

Journal:

Journal of the Optical Society of America

Year:

1971

Language:

english

File:

PDF, 708 KB

english, 1971

18

Expansion of image interaction by the eigenfunction of the transmission cross coefficient to show the interaction between features

Yamazoe, Kenji, Neureuther, Andrew R.

Journal:

Journal of the Optical Society of America A

Year:

2010

Language:

english

File:

PDF, 550 KB

english, 2010

19

Numerical experiment of the Shannon entropy in partially coherent imaging by Koehler illumination to show the relationship to degree of coherence

Yamazoe, Kenji, Neureuther, Andrew R.

Journal:

Journal of the Optical Society of America A

Year:

2011

Language:

english

File:

PDF, 779 KB

english, 2011

20

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - From poly line to transistor: building BSIM models for non-rectangular transistors

Poppe, Wojtek J., Capodieci, Luigi, Wu, Joanne, Neureuther, Andrew, Wong, Alfred K. K., Singh, Vivek K.

Year:

2006

Language:

english

File:

PDF, 296 KB

english, 2006

21

Massively parallel algorithms for scattering in optical lithography

Guerrieri, R., Tadros, K.H., Gamelin, J., Neureuther, A.R.

Journal:

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Year:

1991

Language:

english

File:

PDF, 1022 KB

english, 1991

22

Mitigating Supply Chain Vulnerability

Neureuther, Brian D., Kenyon, George

Journal:

Journal of Marketing Channels

Year:

2009

Language:

english

File:

PDF, 335 KB

english, 2009

23

Physically Based Modeling of Stress-Induced Variation in Nanoscale Transistor Performance

Xu, Nuo, Wang, Lynn Tao-Ning, Neureuther, Andrew R., Liu, Tsu-Jae King

Journal:

IEEE Transactions on Device and Materials Reliability

Year:

2011

Language:

english

File:

PDF, 1.47 MB

english, 2011

24

Application of kernel convolution for complementing source mask optimization

Miller, Marshal A., Yamazoe, Kenji, Neureuther, Andrew R.

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2011

Language:

english

File:

PDF, 849 KB

english, 2011

25

Mutual coupling in linear dipole arrays

Scherer, J., Neureuther, A.

Journal:

IEEE Transactions on Antennas and Propagation

Year:

1972

Language:

english

File:

PDF, 333 KB

english, 1972

26

[IEEE 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Las Vegas, NV, USA (2008.09.30-2008.10.3)] 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Wavelength and polarization dependent absorbtion effects in millisecond annealing of metal gate structures

Ceperley, Daniel P., Neureuther, Andrew R., Hawryluk, Andrew, Xiaoru Wang,, Shen, Michael, Yun Wang,

Year:

2008

Language:

english

File:

PDF, 298 KB

english, 2008

27

[IEEE Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Santa Clara, CA, USA (12-13 June 1989)] Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Process simulation and experiment for RC-parasitics in multilevel metallization

Scheckler, E.W., Lyons, D.E., Neureuther, A.R., Oldham, W.G.

Year:

1989

Language:

english

File:

PDF, 841 KB

english, 1989

28

Phase-shifting mask polarimetry: monitoring polarization at 193-nm high numerical aperture and immersion lithography with phase shifting masks

Neureuther, Andrew R.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2005

Language:

english

File:

PDF, 647 KB

english, 2005

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Aerial image calculation by eigenvalues and eigenfunctions of a matrix that includes source, pupil, and mask

Yamazoe, Kenji, Neureuther, Andrew R., Dusa, Mircea V., Conley, Will

Year:

2010

Language:

english

File:

PDF, 1.83 MB

english, 2010

30

Managing Risks and Disruptions in Global Supply Chains

Neureuther, Brian D.

Journal:

Journal of Marketing Channels

Year:

2009

Language:

english

File:

PDF, 43 KB

english, 2009

31

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Diffusion effects in chemically amplified deep-UV resists

Zuniga, Marco A., Tomacruz, Eric, Neureuther, Andrew R., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 342 KB

english, 1994

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Critical assessment of the transport of intensity equation as a phase recovery technique in optical lithography

Lai, Kafai, Erdmann, Andreas, Shanker, Aamod, Sczyrba, Martin, Connolly, Brid, Kalk, Franklin, Neureuther, Andy, Waller, Laura

Year:

2014

Language:

english

File:

PDF, 906 KB

english, 2014

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Phase measurements of EUV mask defects

Wood, Obert R., Panning, Eric M., Claus, Rene A., Wang, Yow-Gwo, Wojdyla, Antoine, Benk, Markus P., Goldberg, Kenneth A., Neureuther, Andrew R., Naulleau, Patrick P., Waller, Laura

Year:

2015

Language:

english

File:

PDF, 884 KB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Predicting LER PSD caused by mask roughness using a mathematical model

Wood, Obert R., Panning, Eric M., Claus, Rene A., Neureuther, Andrew R., Waller, Laura, Naulleau, Patrick P.

Year:

2014

Language:

english

File:

PDF, 369 KB

english, 2014

35

[IEEE 2010 IEEE Custom Integrated Circuits Conference -CICC 2010 - San Jose, CA, USA (2010.09.19-2010.09.22)] IEEE Custom Integrated Circuits Conference 2010 - Parameter-specific ring oscillator for process monitoring at the 45 nm node

Wang, L. T.-N., Xu, N., Toh, S.-O., Neureuther, A. R., King Liu, T.-J., Nikolic, B.

Year:

2010

Language:

english

File:

PDF, 255 KB

english, 2010

36

Two-dimension diffraction by slits or strips

Mittra, R., Neureuther, A.

Journal:

Electronics Letters

Year:

1966

Language:

english

File:

PDF, 273 KB

english, 1966

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Limitations of resist-based characterization of EUV mask surface roughness

Wood, Obert R., Panning, Eric M., Bhattarai, Suchit, Neureuther, Andrew R., Naulleau, Patrick P.

Year:

2014

Language:

english

File:

PDF, 2.28 MB

english, 2014

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Zernike phase contrast microscope for EUV mask inspection

Wood, Obert R., Panning, Eric M., Wang, Yow-Gwo, Miyakawa, Ryan, Neureuther, Andrew, Naulleau, Patrick

Year:

2014

Language:

english

File:

PDF, 960 KB

english, 2014

39

[IEEE Comput. Soc 5th International Symposium on Quality Electronic Design - San Jose, CA, USA (22-24 March 2004)] SCS 2003. International Symposium on Signals, Circuits and Systems. Proceedings (Cat. No.03EX720) - A pattern matching system for linking TCAD and EDA

Gennari, F.E., Neureuther, A.R.

Year:

2004

Language:

english

File:

PDF, 475 KB

english, 2004

40

SPIE Proceedings [SPIE Developments in Semiconductor Microlithography IV - San Jose (Monday 23 April 1979)] Developments in Semiconductor Microlithography IV - Influence Of Partial Coherence On Projection Printing

O'Toole, M. M., Neureuther, A. R., Dey, James W.

Year:

1979

Language:

english

File:

PDF, 262 KB

english, 1979

41

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Modeling chemically amplified resists for 193-nm lithography

Croffie, Ebo H., Cheng, Mosong, Neureuther, Andrew R., Houlihan, Francis M., Cirelli, Raymond A., Sweeney, James R., Dabbagh, Gary, Watson, Pat G., Nalamasu, Omkaram, Rushkin, Ilya L., Dimov, Ognian N

Year:

2000

Language:

english

File:

PDF, 916 KB

english, 2000

42

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Rigorous electromagnetic simulation applied to alignment systems

Deng, Yunfei, Pistor, Thomas V., Neureuther, Andrew R., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 222 KB

english, 2001

43

[IRE 1974 International Electron Devices Meeting (IEDM) - Washigton, DC, USA (1974.12.9-1974.12.11)] 1974 International Electron Devices Meeting (IEDM) - Limits of optical lithography

Dill, F. H., Tuttle, J. A., Neureuther, A. R.

Year:

1974

Language:

english

File:

PDF, 728 KB

english, 1974

44

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Simulation of image quality issues at low k1 for 100-nm lithography

Neureuther, Andrew R., Adam, Konstantinos, Hotta, Shoji, Pistor, Thomas V., Robins, Garth, Deng, Yunfei, Kawahira, Hiroichi

Year:

2001

Language:

english

File:

PDF, 322 KB

english, 2001

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Smoothing based fast model for images of isolated buried EUV multilayer defects

Clifford, Chris H., Schellenberg, Frank M., Neureuther, Andrew R.

Year:

2008

Language:

english

File:

PDF, 529 KB

english, 2008

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Design for Manufacturability through Design-Process Integration III - Illustration of illumination effects on proximity, focus spillover, and design rules

Wang, Lynn T., Singh, Vivek K., Rieger, Michael L., Yeh, Anthony, Kem, Lilly, Neureuther, Andrew R.

Year:

2009

Language:

english

File:

PDF, 1.07 MB

english, 2009

47

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Survey of chemically amplified resist models and simulator algorithms

Croffie, Ebo H., Yuan, Lei, Cheng, Mosong, Neureuther, Andrew R., Houlihan, Francis M.

Year:

2001

Language:

english

File:

PDF, 595 KB

english, 2001

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Automatic numerical determination of lateral influence functions for fast-CAD

Miller, Marshal A., Dusa, Mircea V., Conley, Will, Yamazoe, Kenji, Neureuther, Andrew R.

Year:

2010

Language:

english

File:

PDF, 1.22 MB

english, 2010

49

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Phase-shifter edge effects on attenuated phase-shifting mask image quality

Wong, Alfred K. K., Ferguson, Richard A., Neureuther, Andrew R., Brunner, Timothy A.

Year:

1994

Language:

english

File:

PDF, 519 KB

english, 1994

50

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Extensions of boundary layer modeling of photomask topography effects to fast-CAD using pattern matching

Miller, Marshal A., Zurbrick, Larry S., Montgomery, M. Warren, Yamazoe, Kenji, Neureuther, Andrew R.

Year:

2009

Language:

english

File:

PDF, 1.46 MB

english, 2009

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